Surface chemical analysis. Depth profiling. Measurement of sputtered depth

Available format(s)

Hardcopy , PDF

Language(s)

English

Published date

26-03-2021

Publisher

British Standards Institution

Committee	CII/60
DocumentType	Standard
Pages	22
PublisherName	British Standards Institution
Status	Current
Supersedes	DD ISO/TR 15969:2001
UnderRevision	DD ISO/TR 15969:2001

This document provides guidelines for measuring the sputtered depth in sputtered depth profiling.

The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1nm to 500µm.