NEN ISO 14606 : 2000
Current
Current
The latest, up-to-date edition.
SURFACE CHEMICAL ANALYSIS - SPUTTER DEPTH PROFILING - OPTIMIZATION USING LAYERED SYSTEMS AS REFERENCE MATERIALS
Published date
12-01-2013
Publisher
Provides guidance on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
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