Surface chemical analysis. Depth profiling. Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

Available format(s)

Hardcopy , PDF

Language(s)

English

Published date

06-10-2020

Publisher

British Standards Institution

Committee	CII/60
DocumentType	Standard
Pages	28
PublisherName	British Standards Institution
Status	Current
Supersedes	BS ISO 16531:2013

This document specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size less than or equal to 1mm in diameter. The methods do not include depth resolution optimization.