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ASTM E 2245 : 2011

ASTM E 2245 : 2011

NA

NA

Status of Standard is Unknown

Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer

Available format(s)

Hardcopy , PDF

Language(s)

English

Published date

01-11-2011

Publisher

American Society for Testing and Materials

Committee
E 08
DocumentType
Test Method
Pages
24
PublisherName
American Society for Testing and Materials
Status
NA
SupersededBy
Supersedes

1.1 This test method covers a procedure for measuring the compressive residual strain in thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an interferometer. Measurements from fixed-fixed beams that are touching the underlying layer are not accepted.

1.2 This test method uses a non-contact optical interferometer with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.

1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

ASTM F 2603 : 2006 : R2012 Standard Guide for Interpreting Images of Polymeric Tissue Scaffolds

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Hardcopy - English
PDF - English
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